Leslie Michael Lea

Defining Conditions for the Etching of Silicon in an Inductive Coupled Plasma Reactor

G. Nicholls, Janet Hopkins, Alan Michael Hynes, 1999 .

Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication

William J. Dauksher, Pawitter J. S. Mangat, Shahid Rauf, 2001 .