J. Ahn

Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling

In-Yong Kang, Yong-Chae Chung, Yong-Chae Chung, 2004 .

Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

Sangsul Lee, T. Kim, J. Ahn, 2010 .

Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)

Yong-Chae Chung, Hye-keun Oh, In-Yong Kang, 2007 .

Nondestructive and Destructive Characterization of Nano-Structured Multilayer

Yong-Chae Chung, S. Y. Lee, In-Yong Kang, 2004 .

Structural characterization of Mo/Ru/Si EUV reflector by optical modeling

Yong-Chae Chung, S. Y. Lee, In-Yong Kang, 2003, Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.

Analysis of multilayer structure for reflection of extreme ultra-violet wavelength

Yong-Chae Chung, Cheolkyu Bok, S. Y. Lee, 2001, Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).

Dry etching of TaN/HfO gate-stack structure in BCl/Ar/O inductively coupled plasmas

Jiyoung Kim, M. Shin, J. Ahn, 2006 .

Damage Free Particle Removal from Extreme Ultraviolet Lithography Mask Layers by High Energy Laser Shock Wave Cleaning

Ahmed Busnaina, Jinho Ahn, Jin-Goo Park, 2008 .

Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas

N. Lee, J. Ahn, Y. R. Park, 2009 .

Dry Etching of TaN/HfO2 Gate Stack Structure by Cl2/SF6/Ar Inductively Coupled Plasma

N. Lee, Jiyoung Kim, J. Ahn, 2005 .

Effect of O2 Gas during Inductively Coupled O2/Cl2 Plasma Etching of Mo and HfO2 for Gate Stack Patterning

N. Lee, Jaegab Lee, Ho‐Young Jung, 2008 .

Effects of additive C4F8 during inductively coupled BCl3∕C4F8∕Ar plasma etching of TaN and HfO2 for gate stack patterning

D. Kim, H. Mok, J. Ahn, 2007 .

Study of a thin Al2O3/TaN absorber stack on Ru-capped multilayers

N. Lee, I. Park, S. Y. Lee, 2006 .

Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)

N. Lee, Hyungdong Lee, J. Ahn, 2009 .