R Lebert

Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy.

K. Bergmann, R. Lebert, A. Engel, 1998, Applied optics.

Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency.

K. Bergmann, R. Lebert, W. Neff, 2000, Applied optics.

Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma.

M. Müller, K. Bergmann, R. Lebert, 1999, Applied optics.