C. Flink

Influence of interstitial copper on diffusion length and lifetime of minority carriers in p-type silicon

Eicke R. Weber, Thomas Heiser, H. Hieslmair, 1997 .

Intrinsic Diffusion Coefficient of Interstitial Copper in Silicon

Eicke R. Weber, Thomas Heiser, H. Hieslmair, 1998 .

Interstitial copper-related center in n-type silicon

Eicke R. Weber, Thomas Heiser, H. Hieslmair, 1997 .

The dissociation energy and the charge state of a copper-pair center in silicon

Eicke R. Weber, Thomas Heiser, H. Hieslmair, 1998 .