Nobuyuki Okamura

A low damage, low contaminant plasma processing system utilizing energy clean technology

Tadashi Shibata, Tadahiro Ohmi, Osamu Kamiya, 1991 .

Advanced Plasma Processing Equipment without Wafer Surface Damage and Chamber Material Contamination

Tadashi Shibata, Tadahiro Ohmi, Osamu Kamiya, 1990 .

Minimizing Wafer Surface Damage and Chamber Material Contamination in New Plasma Processing Equipment

Tadashi Shibata, Tadahiro Ohmi, Osamu Kamiya, 1990 .