John S. Chun

Microstructure and Electrical Properties of Tantalum Oxide Thin Film Prepared by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition

Won-Jong Lee, Jeong Yong Lee, Il Kim, 1994 .

Effects of the deposition temperature on the resistivity of copper films produced by low-pressure metal-organic chemical vapour deposition on a TiN barrier layer

John S. Chun, S. S. Yoon, J. S. Min, 1995, Journal of Materials Science.

A study of the tool life of TiC and TiC plus Al2O3 chemical vapour deposited tungsten carbide tools

John S. Chun, N. H. Kim, J. Chun, 1985 .

Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition

Won-Jong Lee, John S. Chun, IL Kim, 1995 .