J. J. Ponjeé

The relation between lift‐off of photoresist and the surface coverage of trimethylsiloxy groups on silicon wafers: A quantitative time‐of‐flight secondary ion mass spectrometry and contact angle study

F. J. Touwslager, H. van der Wel, J. J. Ponjeé, 1990 .

Priming of silicon substrates with trimethylsilyl containing compounds

H. van der Wel, J. J. Ponjeé, V. B. Marriott, 1990 .