Steffen Schulze

发表

Eugen Wige, Steffen Schulze, Alexander Gehlert, 2016, 2016 Picture Coding Symposium (PCS).

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013 .

Steffen Schulze, Katrin Reblinksy, Tobias Bach, 2002, SPIE Advanced Lithography.

Sean Hannon, Emile Sahouria, Travis Lewis, 2007, SPIE Photomask Technology.

Alfred J. Reich, Kent H. Nakagawa, Steffen Schulze, 2003, SPIE Advanced Lithography.

Emile Sahouria, Steffen Schulze, 2004, Photomask Japan.

Emile Sahouria, Weidong Zhang, Steffen Schulze, 2006, SPIE Photomask Technology.

Steffen Schulze, George E. Bailey, 2004, SPIE Photomask Technology.

Nageswara Rao, Archana Rajagopalan, Peter Buck, 2018, Photomask Technology.

Archana Rajagopalan, Ingo Bork, Peter Buck, 2018, Photomask Technology.

Edita Tejnil, Emile Sahouria, Eric Guo, 2008, SPIE Advanced Lithography.

Toshio Suzuki, Emile Sahouria, Steffen Schulze, 2005, Other Conferences.

Emile Sahouria, Steffen Schulze, Timothy Lin, 2012, European Mask and Lithography Conference.

Ralf Vick, Steffen Schulze, Moawia Al-Hamid, 2011, 10th International Symposium on Electromagnetic Compatibility.

James Word, Steffen Schulze, 2003, SPIE Photomask Technology.

Emile Sahouria, Pradiptya Ghosh, Yan Liu, 2009, Photomask Technology.

Sai Fu, Joseph C. Davis, Steffen Schulze, 2010, European Mask and Lithography Conference.

James Word, Steffen Schulze, 2004, SPIE Advanced Lithography.

Kent H. Nakagawa, Peter D. Buck, Steffen Schulze, 2004, European Mask and Lithography Conference.

Gunter Saake, Wolfram Fenske, Sandro Schulze, 2017, 2017 IEEE 24th International Conference on Software Analysis, Evolution and Reengineering (SANER).

Emile Sahouria, Steffen Schulze, Timothy Lin, 2011, Photomask Technology.

Emile Sahouria, Ahmed Nouh, Travis Lewis, 2008, Photomask Technology.

Steffen Schulze, Timothy Lin, Tom Donnelly, 2009, Advanced Lithography.

Steffen Schulze, E. B. Solovyeva, Hanna Harchuk, 2021, Applied Sciences.