Jong-Cheol Lee

Thermal annealing effects on the structural and electrical properties of HfO2/Al2O3 gate dielectric stacks grown by atomic layer deposition on Si substrates

Jong-Ho Lee, Hee-Sung Kang, Cheol Seong Hwang, 2003 .

Chemical structure of the interface in ultrathin HfO2/Si films

Cheol Seong Hwang, Moonju Cho, C. Hwang, 2004 .

Comparison of HfO2 films grown by atomic layer deposition using HfCl4 and H2O or O3 as the oxidant

Ho-Kyu Kang, Jong-Ho Lee, Cheol Seong Hwang, 2003 .