Stefan Meusemann

Intra-field CDU map correlation between SEMs and aerial image characterization

Martin Tschinkl, Peter Philipp, Lloyd C. Litt, 2014, Photomask Technology.

Comparison of critical dimension measurements of a mask inspection system with a CD-SEM

Stefan Meusemann, Jan Heumann, Clemens Utzny, 2012, Photomask Technology.

CD control with defect inspection: you can teach an old dog a new trick

Rolf Seltmann, Stefan Meusemann, Jan Heumann, 2012, Photomask Technology.

Machine learning methods applied to process qualification

Clemens Utzny, Stefan Meusemann, Mark Herrmann, 2018, European Mask and Lithography Conference.

Tales of scales: how to enable backup process tool qualification for high-end photomasks

Martin Sczyrba, Christian Bürgel, G. R. Cantrell, 2012, Other Conferences.