Paul Ackmann
发表
Martin Tschinkl,
Peter Philipp,
Lloyd C. Litt,
2014,
Photomask Technology.
Brid Connolly,
Craig West,
Paul Ackmann,
2008,
Photomask Technology.
John L. Sturtevant,
Edita Tejnil,
Kent H. Nakagawa,
2013
.
Peter Philipp,
Lloyd C. Litt,
Guoxiang Ning,
2015,
SPIE Photomask Technology.
Yan Wang,
Thomas V. Pistor,
Sohan Singh Mehta,
2015,
Advanced Lithography.
John L. Sturtevant,
Edita Tejnil,
Kent H. Nakagawa,
2013,
Advanced Lithography.
Guoxiang Ning,
Paul Ackmann,
Christian Buergel,
2015,
SPIE Photomask Technology.
John L. Sturtevant,
Edita Tejnil,
Kent H. Nakagawa,
2013,
Photomask Technology.
Lei Sun,
Harry J. Levinson,
Paul W. Ackmann,
2013,
Advanced Lithography.
Andre Leschok,
Jens Busch,
Guoxiang Ning,
2013,
Advanced Lithography.
Andre Leschok,
Thomas Thamm,
Francois Weisbuch,
2012,
Photomask Technology.
Sudhar Raghunathan,
Bruno La Fontaine,
Bo Mu,
2010,
Advanced Lithography.
Andre Leschok,
Thomas Thamm,
Guoxiang Ning,
2012,
Photomask Technology.
Martin Sczyrba,
Rolf Seltmann,
Christian Holfeld,
2012,
Photomask Technology.
Dongqing Zhang,
Lloyd C. Litt,
Yee Mei Foong,
2014,
Advanced Lithography.
Paul Ackmann,
Wenchao Jiang,
Guoxiang Ning,
2017,
Photomask Technology.
Guo Xiang Ning,
Lloyd C. Litt,
Paul Ackmann,
2014,
European Mask and Lithography Conference.
Michael Hsieh,
Paul Ackmann,
Frank Richter,
2012,
Advanced Lithography.
Ute Buttgereit,
Peter Philipp,
Lloyd C. Litt,
2014,
Photomask Technology.
John L. Sturtevant,
Edita Tejnil,
Kent H. Nakagawa,
2014,
European Mask and Lithography Conference.
Harry J. Levinson,
Paul Ackmann,
Lori Peters,
2000,
Photomask Japan.
Yunfei Deng,
Harry J. Levinson,
Martin Sczyrba,
2012,
Photomask Technology.
Thomas Thamm,
Paul Ackmann,
Yee Mei Foong,
2013,
Photomask Technology.