W. Besling

Line resistance behaviour in narrow lines patterned by a TiN hard mask spacer for 45 nm node interconnects

M. Broekaart, Vincent Arnal, Joaquim Torres, 2004 .

Coronoid process enlargement.

W. Besling, R. Van Hoof, R. van Hoof, 1973, The British journal of oral surgery.

Fluidized-bed atomic layer deposition reactor for the synthesis of core-shell nanoparticles.

R. van de Krol, D. Nanu, W. Besling, 2014, The Review of scientific instruments.

Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films

J. Schoonman, A. Goossens, W. Besling, 1998 .

Correlation between electromigration and Cu-contact angle after de-wetting

T. Mourier, J. Dupuy, M. Cordeau, 2006 .

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

Wilfried Vandervorst, Stefan De Gendt, Marc Heyns, 2004 .

Continuity and morphology of TaN barriers deposited by Atomic Layer Deposition and comparison with physical vapor deposition

M. Mellier, J. Torres, A. Humbert, 2004 .

Copper metallization for advanced interconnects: the electrochemical revolution

S. Maitrejean, P. Haumesser, G. Passemard, 2004, Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729).

Reliability challenges accompanied with interconnect downscaling and ultra low-k dielectrics

R. Fox, R. Hoofman, J. Michelon, 2005, Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005..

MEMS oscillating squeeze-film pressure sensor with optoelectronic feedback

Peter G. Steeneken, Lalit Kumar, K. Reimann, 2015 .