Michael J Leeson

Evidence of speckle in extreme-UV lithography.

Pei-Yang Yan, Roel Gronheid, Alessandro Vaglio Pret, 2012, Optics express.

Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model.

Takahiro Kozawa, Seiichi Tagawa, Hai Deng, 2008, Nanotechnology.