Todd R Younkin

Evidence of speckle in extreme-UV lithography.

Pei-Yang Yan, Roel Gronheid, Alessandro Vaglio Pret, 2012, Optics express.

Electro-optic polymer cladding ring resonator modulators.

Jingdong Luo, Brent M. Polishak, Su Huang, 2008, Optics express.

Fluorinated acid amplifiers for EUV lithography.

Seth Kruger, Craig Higgins, Wang Yueh, 2009, Journal of the American Chemical Society.

Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography.

Idriss Blakey, Heping Liu, Anguang Yu, 2010, Macromolecular rapid communications.