Jongchan Lee

发表

Transparent phototransistor with high responsivity, sensitivity, and detectivity from heterojunction metal oxide semiconductors

Sooji Nam, JaeEun Pi, Hee‐Ok Kim, 2020 .

Etching characteristics of thin SiON films using a liquefied perfluorocarbon precursor of C6F12O with a low global warming potential

K. Kwon, Junmyung Lee, Hyun Woo Lee, 2020, Plasma Science and Technology.

High mobility ultra-thin crystalline indium oxide thin film transistor using atomic layer deposition

JaeEun Pi, Seung-Youl Kang, K. Kwon, 2018, Applied Physics Letters.

Phase development and crystallization of CuAlO2 thin films prepared by pulsed laser deposition

Joon-Hyung Lee, Jeong-Joo Kim, Y. Heo, 2010 .

On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N2/Ar Inductively Coupled Plasma

Kwangsoo Kim, A. Efremov, K. Kwon, 2017, Plasma Chemistry and Plasma Processing.

Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio

Kwangsoo Kim, A. Efremov, K. Kwon, 2016 .

Characterization of mesoporous silica thin films for application to thermal isolation layer

H. Cho, Hyung‐Ho Park, K. Kwon, 2018, Thin Solid Films.

Growth of CuInO2 thin film using highly dense Cu2O―In2O3 composite targets

Joon-Hyung Lee, Jeong-Joo Kim, Y. Heo, 2009 .

Growth of Mg Doped CuCrO 2 by Pulsed Laser Deposition

Seyul Kim, Joon-Hyung Lee, Jeong-Joo Kim, 2009 .

Effects of plasma treatment on the electrical reliability of multilayer MoS 2 field-effect transistors

Ji-Woon Yang, K. Kwon, Jongchan Lee, 2017 .

Etching Kinetics and Dielectric Properties of SiOC Films exposed to Ar and CF4 plasmas

A. Efremov, K. Kwon, Junmyung Lee, 2022, Thin Solid Films.