W. Koh

发表

Highly conducting, transparent, and flexible indium oxide thin film prepared by atomic layer deposition using a new liquid precursor Et2InN(SiMe3)2.

Jin-seong Park, K. Chung, Si-Young Choi, 2014, ACS applied materials & interfaces.

Growth of magnesium oxide thin films using single molecular precursors by metal-organic chemical vapor deposition

J. Boo, W. Koh, Yunsoo Kim, 1999 .

Atomic layer deposition of stoichiometric Co3O4 films using bis(1,4-di-iso-propyl-1,4-diazabutadiene) cobalt

Jae-Min Park, Won-Jun Lee, T. R. Mayangsari, 2015 .

MOCVD of MgAl2O4 thin films using new single molecular precursors: application of β-hydrogen elimination to the growth of heterometallic oxide films

J. Boo, C. G. Kim, W. Koh, 2001 .

Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel

Jae-Min Park, Won-Jun Lee, W. Han, 2018 .

Atomic layer deposition and tellurization of Ge–Sb film for phase-change memory applications

Jae-Min Park, Won-Jun Lee, Yewon Kim, 2019, RSC advances.

Preparation of MgO films on GaAs by metalorganic chemical vapor deposition

J. Boo, W. Koh, Y. Kim, 1996 .

Evaluation of integrity and barrier performance of atomic layer deposited WNxCy films on plasma enhanced chemical vapor deposited SiO2 for Cu metallization

Ki-Bum Kim, Hyun-Mi Kim, Ki-Su Kim, 2006 .

Single-source CVD of MgAl2O4

W. Koh, S. Ku, Y. Kim, 1998 .

Chemical vapor deposition of Al2O3 films using highly volatile single sources

W. Koh, S. Ku, Y. Kim, 1997 .

Chemical Vapor Deposition of Ti-Si-N Films with Alternating Source Supply

Sang-Won Kang, Hyung-Sang Park, J. Min, 1999 .

Atomic Layer Deposition of Ta 2 O 5 Films Using Ta(OC 2 H 5 ) 5 and Nh 3

Sang-Won Kang, W. Koh, Hyun-Jung Song, 1999 .

Bottom-up Filling of Submicrometer Features in Catalyst-Enhanced Chemical Vapor Deposition of Copper

Sang-Won Kang, Hyung-Sang Park, W. Koh, 2002 .