Sang U. Kim

Analysis of retention tail distribution induced by scaled shallow trench isolation for high densityDRAMs

Young Pil Kim, Beom Jun Jin, Joo Tae Moon, 2001, Microelectron. Reliab..

ESD induced gate oxide damage during wafer fabrication process

Sang U. Kim, 1993 .

Electrical analysis of DRAM cell transistors for the root-cause addressing of the tRDL time-delay failure

U-In Chung, Young Pil Kim, Joo Tae Moon, 2003, Microelectron. Reliab..

Electrical characterization of FSG low K dielectric deposition in HDP and PECVD tools

Gennadi Bersuker, Michael J. Shapiro, Sang U. Kim, 1997, Advanced Lithography.