Soichi Inoue

发表

Analysis of wafer flatness for CD control in photolithography

Soichi Inoue, Tadahito Fujisawa, Masafumi Asano, 2002, SPIE Advanced Lithography.

Design intent utilization for lithography compliance check and layout refinement to improve manufacturability

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2011, 2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM).

Hot spot management in ultra-low k1 lithography

Eiji Yamanaka, Soichi Inoue, Kohji Hashimoto, 2006, SPIE Advanced Lithography.

Ultra-low k1 oxide contact hole formation and metal filling using resist contact hole pattern by double L&S formation method

Soichi Inoue, Satoshi Tanaka, Yasuyuki Taniguchi, 2007, SPIE Advanced Lithography.

Full-Chip Layout Optimization for Process Margin Enhancement Using Model-Based Hotspot Fixing System

Soichi Inoue, Toshiya Kotani, Koji Nakamae, 2010 .

Enhanced flexible mask specifications

Kohji Hashimoto, Osamu Ikenaga, Soichi Inoue, 2003, Photomask Japan.

Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 1999, Advanced Lithography.

Resist outgassing characterization based on the resist compositions and process

Soichi Inoue, Yukiko Kikuchi, Hiroyuki Tanaka, 2013, Advanced Lithography.

Improvement of photomask repeater for 130-nm lithography

Soichi Inoue, Naoya Hayashi, Yuuki Ishii, 2001, Photomask Japan.

Resist footing variation and compensation over nonplanar wafer

Soichi Inoue, Kohji Hashimoto, Takashi Sato, 2003, SPIE Advanced Lithography.

Development of hot spot fixer (HSF)

Soichi Inoue, Toshiya Kotani, Atsuhiko Ikeuchi, 2006, SPIE Advanced Lithography.

Correlation study on resist outgassing between EUV and e-beam irradiation

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2014, Advanced Lithography.

Development of computational spacer patterning technology

Soichi Inoue, Toshiya Kotani, Shoji Mimotogi, 2010, Photomask Japan.

New pattern generation system based on i-line stepper: photomask repeater

Soichi Inoue, Katsuya Okumura, Ichiro Mori, 2000, Advanced Lithography.

New-concept i-line stepper for mask fabrication

Soichi Inoue, Katsuya Okumura, Yuuki Ishii, 2000, Photomask Japan.

Design intent application to tolerance-based manufacturing system

Soichi Inoue, Koji Nakamae, Sachiko Kobayashi, 2011 .

Measurement of transmittance variation of projection lenses depending on the light paths using a grating-pinhole mask

Soichi Inoue, Kazuya Sato, 2001, SPIE Advanced Lithography.

Lithography oriented DfM for 65 nm and beyond

Soichi Inoue, Toshiya Kotani, Atsuhiko Ikeuchi, 2006, SPIE Advanced Lithography.

Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2002, SPIE Advanced Lithography.

Development of an accurate empirical model for ArF lithography

Soichi Inoue, Shoji Mimotogi, Daisuke Kawamura, 2004, SPIE Advanced Lithography.

Manufacturing system based on tolerance deduced from design intention

Soichi Inoue, Sachiko Kobayashi, Suigen Kyoh, 2009, Advanced Lithography.

Desirable reticle flatness from focus deviation standpoint optical lithography

Soichi Inoue, Masafumi Asano, Katsuya Okumura, 2002, SPIE Advanced Lithography.

Yield-centric layout optimization with precise quantification of lithographic yield loss

Soichi Inoue, Suigen Kyoh, Sachiko Kobayashi, 2008, Photomask Japan.

Hotspot detection using image pattern recognition based on higher-order local auto-correlation

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2011, Advanced Lithography.

Phase-contrast lithography

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, 1993, Advanced Lithography.

Systematic yield estimation method applying lithography simulation

Soichi Inoue, Suigen Kyoh, 2008, SPIE Advanced Lithography.

Dependence of mask topography effects on pattern variation under hyper-NA lithography

Soichi Inoue, Shoji Mimotogi, Masamitsu Itoh, 2008, Photomask Japan.

Flexible mask specifications

Osamu Ikenaga, Soichi Inoue, Kohji Hashimoto, 2002, Photomask Japan.

Mask defect specification in the spacer patterning process by using a fail-bit-map analysis

Hiroyuki Morinaga, Soichi Inoue, Kohji Hashimoto, 2009, Lithography Asia.

New process proximity correction using neural network in spacer patterning technology

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2009, Advanced Lithography.

Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2003, Photomask Japan.

Impact of OPC aggressiveness on mask maufacturability

Soichi Inoue, Toshiya Kotani, Ichiro Mori, 2003, Photomask Japan.

CD control with effective exposure dose monitor technique in photolithography

Soichi Inoue, Tadahito Fujisawa, Masafumi Asano, 2002, SPIE Advanced Lithography.

EUV actinic blank inspection tool with a high magnification review mode

Soichi Inoue, Tsuneo Terasawa, Hidehiro Watanabe, 2012, Other Conferences.

Impact of across-pupil transmittance variation in projection lenses on fine device pattern imaging

Soichi Inoue, Shoji Mimotogi, Tatsuhiko Higashiki, 2003, SPIE Advanced Lithography.

Approach for reducing resist footing over nonplanar wafer

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2004, SPIE Advanced Lithography.

Automated hot-spot fixing system applied for metal layers of 65 nm logic devices

Soichi Inoue, Toshiya Kotani, Suigen Kyoh, 2006, Photomask Japan.

Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance

Kohji Hashimoto, Soichi Inoue, Masaki Satake, 2007, Photomask Japan.

Flexible mask specifications

Kohji Hashimoto, Osamu Ikenaga, Soichi Inoue, 2002, Photomask Technology.

Automated hot-spot fixing system applied to the metal layers of 65-nm logic devices

Soichi Inoue, Toshiya Kotani, Suigen Kyoh, 2007 .

Contribution of EUV resist components to the non-cleanable contaminations

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2014, Advanced Lithography.

Desirable wafer edge flatness for CD control in photolithography

Soichi Inoue, Tadahito Fujisawa, Katsuya Okumura, 2003, SPIE Advanced Lithography.

Feasibility of ultra-low k1 lithography for 28nm CMOS node

Soichi Inoue, Shoji Mimotogi, Hideaki Harakawa, 2009, Advanced Lithography.

Patterning performance of hyper NA immersion lithography for 32nm node logic process

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2008, Lithography Asia.

Photomask repeater strategy for high-quality and low-cost reticle fabrication

Osamu Ikenaga, Soichi Inoue, Naoya Hayashi, 2003, Photomask Japan.

Accurate proximity correction method with total-process proximity-based correction factor (TCF)

Soichi Inoue, Kohji Hashimoto, Satoshi Usui, 1998, Advanced Lithography.

Robust PPC and DFM methodology for exposure tool variations

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2008, SPIE Advanced Lithography.

Foerfarande Foer the manufacturing of I kalciumsilikatformprodukt

Soichi Inoue, Yasuo Oguri, Mitsuru Awata, 1981 .

Study of EUV outgassing spatial distribution toward witness plate in the EUV outgas tester

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2013, Advanced Lithography.

New concept of specification for mask flatness

Soichi Inoue, Katsuya Okumura, Tsuneyuki Hagiwara, 2002, Photomask Japan.

Hotspot management and its applications in ultralow k1 lithography

Eiji Yamanaka, Soichi Inoue, Kohji Hashimoto, 2009 .

Analysis of EUV resist outgassing depended on the dosage

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2015, Advanced Lithography.

Evaluation of extendibility for Fourier diffraction theory for topographical mask structure under hyper NA lithography

Soichi Inoue, Satoshi Tanaka, Akiko Mimotogi, 2004, SPIE Advanced Lithography.

Discrete Radon transform in a continuous space

Soichi Inoue, Toshio Honda, Jumpei Tsujiuchi, 1987 .

New type of xerographic x-ray camera

Soichi Inoue, Shunji Shirouzu, 1993, Medical Imaging.

Scanner fleet management utilizing programmed hotspot patterns

Eiji Yamanaka, Hiroyuki Morinaga, Soichi Inoue, 2008, Photomask Japan.

Model-based PPC verification methodology with two dimensional pattern feature extraction

Kohji Hashimoto, Soichi Inoue, Shigeki Nojima, 2003, SPIE Advanced Lithography.

All-out fight against yield losses by design-manufacturing collaboration in nano-lithography era

Soichi Inoue, Sachiko Kobayashi, 2011, 16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011).

Lithography simulation system for total CD control from design to manufacturing

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2005, SPIE Advanced Lithography.

Novel OPC and DfM methodology for 3D memory device

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2009, Photomask Japan.

Patterning strategy and performance of 1.3NA tool for 32nm node lithography

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2008, SPIE Advanced Lithography.

Novel fine-tuned model-based SRAF generation method using coherence map

Soichi Inoue, Chikaaki Kodama, Toshiya Kotani, 2010, Advanced Lithography.

Effective exposure-dose measurement in optical microlithography

Soichi Inoue, Tadahito Fujisawa, Kyoko Izuha, 2000, Advanced Lithography.

Desirable reticle flatness from focus deviation standpoint in optical lithography

Soichi Inoue, Masafumi Asano, Katsuya Okumura, 2002 .

A novel lithography design and verification methodology with patterning failure

Soichi Inoue, Kohji Hashimoto, Satoshi Tanaka, 2008, Lithography Asia.

Accurate model base verification scheme to eliminate hotspots and manage warmspots

Soichi Inoue, Shigeki Nojima, Suigen Kyoh, 2008, SPIE Advanced Lithography.

Ultimately accurate SRAF replacement for practical phases using an adaptive search algorithm based on the optimal gradient method

Soichi Inoue, Shigeki Nojima, Tetsuaki Matsunawa, 2010, Advanced Lithography.

Tool-induced hotspot fixing flow for high volume products

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2008, Photomask Japan.

Hot spot management with die-to-database wafer inspection system

Soichi Inoue, Kohji Hashimoto, Satoshi Usui, 2008, SPIE Advanced Lithography.

Validation of process cost effective layout refinement utilizing design intent

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2011, Advanced Lithography.

130-nm KrF lithography for DRAM production with 0.68-NA scanner

Soichi Inoue, Eiichi Kawamura, Hideyuki Kanemitsu, 2000, Advanced Lithography.

A method for inspecting an exposure apparatus, an exposure method for correcting a focal point, and a method for manufacturing a semiconductor device.

Soichi Inoue, Shoji Mimotogi, Takashi Sato, 2002 .

New photomask pattern generation method based on i-line stepper

Soichi Inoue, Katsuya Okumura, Yuuki Ishii, 2000, Photomask Japan.

Design intention application to tolerance-based manufacturing system

Soichi Inoue, Koji Nakamae, Sachiko Kobayashi, 2010, Advanced Lithography.

Practical topography design for alternating phase-shifting mask

Soichi Inoue, Kenji Kawano, Satoshi Tanaka, 1996, Advanced Lithography.

Feasibility study on the impact of high-power EUV irradiation on key lithographic elements

Soichi Inoue, Hiroyuki Tanaka, Shinji Mikami, 2015, Advanced Lithography.

Mask defect printability in the spacer patterning process

Soichi Inoue, Kohji Hashimoto, Takashi Hirano, 2008, Photomask Technology.

A novel fast 3D resist simulation method using Chebyshev expansion

Soichi Inoue, Shoji Mimotogi, Satoshi Tanaka, 2009, Advanced Lithography.

Run-to-run CD error analysis and control monitoring of effective dose and focus

Soichi Inoue, Tadahito Fujisawa, Masafumi Asano, 2003, SPIE Advanced Lithography.

Resist outgassing characterization for qualification in high power EUV lithography

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2012, Advanced Lithography.

Development of an advanced mask and its fabrication system

Soichi Inoue, Akira Ono, Shinichi Ito, 1995, Photomask and Next Generation Lithography Mask Technology.

Yield-enhanced layout generation by new design for manufacturability (DfM) flow

Soichi Inoue, Toshiya Kotani, Shigeki Nojima, 2004, SPIE Advanced Lithography.

Automatic optical proximity correction with optimization of stepper condition

Soichi Inoue, Shoji Mimotogi, Tadahito Fujisawa, 1995, Advanced Lithography.

Impact of patterning strategy on mask fabrication beyond 32nm

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2008, Photomask Japan.

Assessment of wafer pattern prediction accuracy by introducing effectively equivalent mask patterns

Kohji Hashimoto, Soichi Inoue, Shoji Mimotogi, 2006, Photomask Japan.

Systematic yield estimation method applying lithography simulation - art. no. 69250Q

Soichi Inoue, Suigen Kyoh, 2008 .

Tolerance-Based Wafer Verification Methodologies with a Die-to-Database Inspection System

Soichi Inoue, Kohji Hashimoto, Toshiya Kotani, 2009 .

Influence of pellicle mounting to predicted mask flatness

Soichi Inoue, Tsuneyuki Hagiwara, Masamitsu Itoh, 2005, Other Conferences.

Management of pattern generation system based on i-line stepper

Soichi Inoue, Katsuya Okumura, Yuuki Ishii, 2001, SPIE Photomask Technology.

Contact hole formation by multiple exposure technique in ultralow-k1 lithography

Soichi Inoue, Koji Hashimoto, Shoji Mimotogi, 2004, SPIE Advanced Lithography.

Measurement of effective source shift using a grating-pinhole mask

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, 1999, Advanced Lithography.

Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition

Soichi Inoue, Tadahito Fujisawa, Masafumi Asano, 2003, SPIE Advanced Lithography.

Process window aware layout optimization using hot spot fixing system

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2007, SPIE Advanced Lithography.

Optimal setting strategy for kernel-based OPC simulation engines

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2009, Advanced Lithography.

Tandem process proximity correction method

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2002, SPIE Advanced Lithography.

New concept photomask repeater with stitching exposure technique

Soichi Inoue, Katsuya Okumura, Yuuki Ishii, 2001, SPIE Photomask Technology.

Multi-field imprint technology: enabling the productivity enhancement of NIL

Soichi Inoue, Ryoichi Inanami, Tetsuro Nakasugi, 2021, Advanced Lithography.

Comparison of Resist Family Outgassing Characterization between EUV and EB

Soichi Inoue, Hiroyuki Tanaka, Toshiya Takahashi, 2013 .

Ultralow k 1 oxide contact hole formation and metal filling using resist contact hole pattern by double line and space formation method

Soichi Inoue, Hiroko Nakamura, Mitsuhiro Omura, 2008 .

Contact hole formation by multiple exposure technique in ultralow k 1 lithography

Soichi Inoue, Shoji Mimotogi, Yasunobu Onishi, 2005 .

Effective exposure-dose monitor technique for critical dimension control in optical lithography

Soichi Inoue, Tadahito Fujisawa, Masafumi Asano, 2003 .

Comparison of Resist Outgassing Characterization between High Power EUV and EB

Soichi Inoue, Hiroyuki Tanaka, Toshiya Takahashi, 2012 .

A 0.15 /spl mu/m KrF lithography for 1 Gb DRAM product using highly printable patterns and thin resist process

Soichi Inoue, Masamitsu Itoh, Daisuke Kawamura, 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

Simulation Study on Phase-Shifting Masks for Isolated Patterns

Soichi Inoue, Yoko Tanaka, Shuichi Tamamushi, 1991 .

Effect of Coherence Factor σ and Shifter Arrangement for the Levenson-Type Phase-Shifting Mask

Soichi Inoue, Kohji Hashimoto, Kenji Kawano, 1992 .

Optimization of partially coherent optical system for optical lithography

Soichi Inoue, Tadahito Fujisawa, Makoto Nakase, 1992 .

Ion implantation as insoluble treatment for resist-stacking process

Soichi Inoue, Hiroko Nakamura, Katsumi Rikimaru, 2010 .