Lena Zavyalova

发表

Synthetic defocus in interferometric lithography

Anatoly Bourov, Jianming Zhou, Yongfa Fan, 2004, SPIE Advanced Lithography.

Immersion lithography fluids for high NA 193 nm lithography

Neal Lafferty, Anatoly Bourov, Jianming Zhou, 2004, SPIE Advanced Lithography.

Conference of Microelectronic Research 1996

David Stern, Suraj Bhaskaran, Thomas Flynn, 1991 .

Resist reflow for 193-nm low-K1 lithography contacts

Kevin D. Lucas, Mireille Maenhoudt, Grozdan Grozev, 2003, SPIE Advanced Lithography.

Automated aberration extraction using phase wheel targets

Bruce W. Smith, Anatoly Bourov, Lena V. Zavyalova, 2005, SPIE Advanced Lithography.

Measuring aberrations in lithographic projection systems with phase wheel targets

Lena Zavyalova, 2010 .

25 nm immersion lithography at 193 nm wavelength

Bruce W. Smith, Yongfa Fan, Michael A. Slocum, 2004, SPIE Advanced Lithography.

Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications

Bruce W. Smith, Anatoly Bourov, Lena Zavyalova, 1999, Advanced Lithography.

In-situ aberration monitoring using phase wheel targets

Bruce W. Smith, Toshiro Itani, Julian S. Cashmore, 2004, SPIE Advanced Lithography.

Implementation and benefits of advanced process control for lithography CD and overlay

Chong-Cheng Fu, Lena Zavyalova, Gary Stanley Seligman, 2003, SPIE Advanced Lithography.

Effects of excimer laser radiation on attenuated phase-shift masking materials

Bruce W. Smith, Anatoly Bourov, Lena Zavyalova, 1997, Advanced Lithography.

Mask-induced polarization

Neal Lafferty, Bruce W. Smith, Anatoly Bourov, 2004, SPIE Advanced Lithography.

Optimization of the contact layer for 90-nm node lithography

Kevin D. Lucas, Kirk J. Strozewski, Lena Zavyalova, 2003, SPIE Advanced Lithography.

Practical approach to full-field wavefront aberration measurement using phase wheel targets

Bruce W. Smith, Donis G. Flagello, Anatoly Bourov, 2006, SPIE Advanced Lithography.

Optical extension at the 193-nm wavelength

Bruce W. Smith, Martin McCallum, Gilles R. Amblard, 1999, Advanced Lithography.

Combining lithography and etch models in OPC modeling

James P. Shiely, Thomas Schmoeller, Hua Song, 2014, Advanced Lithography.

ILSim: a compact simulation tool for interferometric lithography

Neal Lafferty, Anatoly Bourov, Jianming Zhou, 2004, SPIE Advanced Lithography.

Illumination pupil filtering using modified quadrupole apertures

Bruce W. Smith, John S. Petersen, Lena Zavyalova, 1998, Advanced Lithography.

Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography

Neal Lafferty, Bruce W. Smith, Anatoly Bourov, 2004, SPIE Advanced Lithography.

Modeling mask pellicle effects for OPC/RET

James P. Shiely, Kevin Lucas, Qiaolin Zhang, 2008, Photomask Japan.

Using machine learning etch models in OPC and ILT correction

Kevin Hooker, Lena Zavyalova, Shuo Huang, 2021 .

Validation of machine learning OPC compact models for advanced manufacturing

Kevin Lucas, Marco Guajardo, Cheng-En Wu, 2021 .

25nm Immersion Lithography at a 193nm Wavelength

Bruce W. Smith, Yongfa Fan, Michael A. Slocum, 2005 .

Investigation into excimer laser radiation damage of deep ultraviolet optical phase masking films

Bruce W. Smith, Anatoly Bourov, Lena Zavyalova, 1997 .

Water immersion optical lithography at 193 nm

Neal Lafferty, Bruce W. Smith, Anatoly Bourov, 2004 .