Byungwhan Kim

Gary S. May, Byungwhan Kim, 1995, Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'.

Modeling of Process Plasma Using a Radial Basis Function Network: A Case Study

Byungwhan Kim, Sungjin Park, 2000 .

Plasma diagnosis by recognizing in situ data using a modular backpropagation network

Sungmo Kim, Byungwhan Kim, 2003 .

Functional Kernel-Based Modeling of Wavelet Compressed Optical Emission Spectral Data: Prediction of Plasma Etch Process

Young-Don Ko, Byungwhan Kim, Myong-Kee Jeong, 2010, IEEE Sensors Journal.

Plasma Control Using a Linear Quadratic Regulated RF Impedance Match Process

Gwi Tae Park, Jang Hyun Park, Byungwhan Kim, 2001 .

Diagnosis of Plasma Equipment using Neural Network and Impedance Match Monitoring

Byungwhan Kim, Byungwhan Kim, 2002 .

Characterization of Profile Uniformity Using Wavelet and Neural Networks

Byungwhan Kim, Won Sun Choi, Myo Teak Lim, 2002 .

Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment

Jeong Kim, Seongjin Choi, Byungwhan Kim, 2009, Expert Syst. Appl..

Wavelet-coupled backpropagation neural network as a chamber leak detector of plasma processing equipment

Sanghee Kwon, Byungwhan Kim, 2011, Expert Syst. Appl..

Use of neural network to in situ conditioning of semiconductor plasma processing equipment

Daehyun Kim, Byungwhan Kim, 2012, Appl. Soft Comput..

Promoter classification using random generator-controlled generalized regression neural network

Sang Ho Park, Kunho Kim, Byungwhan Kim, 2003 .

A Plasma-Etching Process Modeling Via a Polynomial Neural Network

Gwi-Tae Park, Dong-Won Kim, Byungwhan Kim, 2004 .

A New Approach to Mid- and Long-term Power System Analysis

Byungwhan Kim, J. C. Kim, Yoon-Dong Park, 1989 .

Prediction of Radio Frequency Impedance Matching in Plasma Equipment Using Neural Network

Donghwan Kim, Seung Soo Han, Byungwhan Kim, 2006, ISNN.

Prediction of plasma etching using genetic-algorithm controlled backpropagation neural network

Sungmo Kim, Byungwhan Kim, 2003 .

Fuzzy Logic Model of Langmuir Probe Discharge Data

Beom-Soo Kim, Byungwhan Kim, Jang Hyun Park, 2002, Comput. Chem..

Modular Backpropagation Network to Diagnosing Plasma Processing Equipment

Byungwhan Kim, 2002 .

Diagnosis model of radio frequency impedance matching in plasma equipment by using neural network and wavelets

Donghwan Kim, Seung Soo Han, Jae Young Park, 2006 .

Prediction of plasma etching using a randomized generalized regression neural network

Seongjin Choi, Byungwhan Kim, Byungwhan Kim, 2004 .

Optimization of Wavelet-Filtered In-Situ Plasma Etch Data Using Neural Network and Genetic Algorithm

Byungwhan Kim, Dongil Han, Byungwhan Kim, 2011 .

A neural network plasma model of semiconductor manufacturing equipment

Byungwhan Kim, Gwi-Tae Park, Chang-Keun Lee, 1999, FUZZ-IEEE'99. 1999 IEEE International Fuzzy Systems. Conference Proceedings (Cat. No.99CH36315).

GA-optimized backpropagation neural network with multi-parameterized gradients and applications to predicting plasma etch data

Byungwhan Kim, Byungwhan Kim, Sungmo Kim, 2005 .

Prediction of surface microtrenching by using neural network

Byungwhan Kim, Donghwan Kim, Jae Young Park, 2007 .

Plasma control using neural network and optical emission spectroscopy

Byungwhan Kim, Byungwhan Kim, Jung Ki Bae, 2005 .

Prediction of silicon oxynitride plasma etching using a generalized regression neural network

Byungwhan Kim, Byung-Teak Lee, Byung-Teak Lee, 2005 .

Modelling of plasma etching using a generalized regression neural network

Kunho Kim, Byungwhan Kim, Byungwhan Kim, 2003 .

Modeling oxide etching in a magnetically enhanced reactive ion plasma using neural networks

Kwang-Ho Kwon, Byungwhan Kim, Bo-Woo Kim, 2002 .

Prediction of plasma etching using a polynomial neural network

Dong-Won Kim, Byungwhan Kim, Gwi Tae Park, 2003 .

Advanced neural network model of plasma-driven integrated circuit process data

Changki Min, Byungwhan Kim, Donghwan Kim, 2007 .

Modeling of ion energy distribution using time-series neural network

Byungwhan Kim, Byungwhan Kim, Suyeon Kim, 2008, International Conference on Systems.

Prediction of plasma etch process by using actinometry-based optical emission spectroscopy data and neural network

Byungwhan Kim, Minji Kwon, 2009 .

Room Temperature Deposition Process for Manufacturing Silicon Nitride Films Using Pulsed Plasma and Neural Network

Byungwhan Kim, Dongil Han, Daehyun Kim, 2011 .

Plasma etching of silicon oxynitride in a low-pressure C2F6 plasma

Byungwhan Kim, Byung-Teak Lee, J. Park, 2005 .

Qualitative modeling of silica plasma etching using neural network

Byungwhan Kim, K. Kwon, Byungwhan Kim, 2003 .

Qualitative fuzzy logic model of plasma etching process

Byungwhan Kim, Jang Hyun Park, 2002 .

Prediction of profile surface roughness in CHF3/CF4 plasma using neural network

Byungwhan Kim, Byungwhan Kim, Kunho Kim, 2004 .

Refraction properties of PECVD of silicon nitride film

Byungwhan Kim, Dong Won Kim, Seung-Soo Han, 2004 .

Prediction of chamber leak pattern using time-series neural network

Byungwhan Kim, Minji Kwon, Byung Chan Park, 2008, ICONS 2008.

Prediction of etch microtrenching using a neural network

Byungwhan Kim, K. Kwon, Byungwhan Kim, 2004 .

A Novel Confusion-Line Separation Algorithm Based on Color Segmentation for Color Vision Deficiency

Dongil Han, Seong Joon Yoo, Byungwhan Kim, 2012 .

Modeling refraction characteristics of silicon nitride film deposited in a SiH/sub 4/-NH/sub 3/-N/sub 2/ plasma using neural network

Seung-Soo Han, Byungwhan Kim, Tae Seon Kim, 2003 .

Modeling of sidewall bottom etching using a neural network

Byungwhan Kim, Dongil Han, Seungbin Moon, 2005 .

Modelling of plasma etching process using radial basis function network and genetic algorithm

Seung Bin Moon, Byungwhan Kim, Dongil Han, 2005 .

Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition

Byungwhan Kim, Byungwhan Kim, Sungmo Kim, 2004 .

Characterization of inductively coupled plasma using neural networks

Byungwhan Kim, Byungwhan Kim, Sungjin Park, 2002 .

Prediction of Surface Roughness Using X-Ray Photoelectron Spectroscopy and Neural Networks

Byungwhan Kim, Byungwhan Kim, Min-Geun Park, 2006, Applied spectroscopy.

Modeling of plasma process data using a multi-parameterized generalized regression neural network

Sanghee Kwon, Byungwhan Kim, Minji Kwon, 2009 .

Ex Situ Plasma Diagnosis by Recognition of X-Ray Photoelectron Spectroscopy Data Using a Neural Network

Gi Tae Kim, Byungwhan Kim, Hwa Jun Lee, 2008 .

Use of Neural Network and Genetic Algorithm to Model Scanning Electron Microscopy for Enhanced Image of Material Surfaces

Sung Wook Baik, Byungwhan Kim, Dong Hwan Kim, 2011 .

Effect of Plasma and Control Parameters on SiC Etching in a C2F6 Plasma

Byungwhan Kim, Byung-Teak Lee, 2003 .

An optimal neural network plasma model: a case study

Byungwhan Kim, Byungwhan Kim, Sungjin Park, 2001 .

Using neural networks with a linear output neuron to model plasma etch processes

Byungwhan Kim, Byungwhan Kim, Wookyung Choi, 2001, ISIE 2001. 2001 IEEE International Symposium on Industrial Electronics Proceedings (Cat. No.01TH8570).

Prediction of radio frequency power effect on silicon nitride deposition using a genetic algorithm based neural network

Byungwhan Kim, Byungwhan Kim, J. Bae, 2006 .

Optimization of Principal-Component-Analysis-Applied in Situ Spectroscopy Data Using Neural Networks and Genetic Algorithms

Byungwhan Kim, Byungwhan Kim, Min Ji Kwon, 2008, Applied spectroscopy.