Robin Ackel

Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

Kenneth C. Racette, Michael J. Lercel, Emily Fisch, 2002, SPIE Advanced Lithography.

Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks

Kenneth C. Racette, Michael J. Lercel, Phillip L. Reu, 2001, SPIE Advanced Lithography.

EPL mask fabrication

Michael J. Lercel, Emily Fisch, Louis Kindt, 2002, Photomask Japan.

Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks

Kenneth C. Racette, Emily Fisch, Louis Kindt, 2003, SPIE Advanced Lithography.

Patterning-induced image placement distortions on electron beam projection lithography membrane masks

Roxann L. Engelstad, Kenneth C. Racette, Michael J. Lercel, 2001 .