S. Kyoh

Variability aware modeling and characterization in standard cell in 45 nm CMOS with stress enhancement technique

T. Sanuki, M. Iwai, E. Morifuji, 2008, 2008 Symposium on VLSI Technology.

Application of Extreme Ultraviolet Lithography to Test Chip Fabrication

H. Aoyama, S. Magoshi, Satoshi Tanaka, 2011 .

Electronic sputtering process of SiO2 under heavy ion bombardment

A. Shimizu, S. Kyoh, A. Itoh, 1998 .