A. Sakata

Variability aware modeling and characterization in standard cell in 45 nm CMOS with stress enhancement technique

T. Sanuki, M. Iwai, E. Morifuji, 2008, 2008 Symposium on VLSI Technology.

Layout Dependence Modeling for 45-nm CMOS With Stress-Enhanced Technique

M. Iwai, E. Morifuji, F. Matsuoka, 2009, IEEE Transactions on Electron Devices.