K. Hoffmann

Models for implantation into multilayer targets

Heiner Ryssel, Jürgen Lorenz, H. Ryssel, 1986 .

Simulation of doping processes

K. Haberger, G. Prinke, R. Dumcke, 1980 .

Description of arsenic and boron profiles implanted in SiO2, Si3N4 and Si using Pearson distributions with four moments

G. Prinke, H. Ryssel, J. Biersack, 1981 .