A. H. Perera

发表

Field Oxide Thinning in Poly Buffer LOCOS Isolation with Active Area Spacings to 0.1 μm

J. P. Krusius, J. W. Lutze, A. H. Perera, 1990 .

Ultimate CMOS density limits: measured source drain resistance in ultra small devices

J. P. Krusius, A. H. Perera, 1989, International Technical Digest on Electron Devices Meeting.