P. Nielson

Pulsed damage thresholds of flouride and oxide thin films from 0.26 μm to 1.06 μm

Arthur H. Guenther, C. G. Fry, Timothy W. Walker, 1980 .

Alternate metal virtual ground EPROM array implemented in a 0.8 mu m process for very high density applications

Hosam Haggag, Albert Bergemont, A. Kablanian, 1991, International Electron Devices Meeting 1991 [Technical Digest].