H.L. Chen

Multilayer bottom antireflective coatings for high numerical aperture and modified illumination exposure systems

H.L. Chen, W. Fan, T.J. Wang, 2002, 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers..

Reduction of substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography

H.L. Chen, M.C. Shih, C.F. Hsieh, 2001, Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).