Satyendra Prakash Pal

Recent advances in non-chemically amplified photoresists for next generation IC technology

Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep, 2016 .

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications.

Subrata Ghosh, Pawan Kumar, Pulikanti Guruprasad Reddy, 2017, ACS applied materials & interfaces.