G. Quintana

Reactive Plasma Deposited Si‐N Films for MOS‐LSI Passivation

Hyman Joseph Levinstein, H. Levinstein, S. Haszko, 1978 .

Oxidation induced stacking faults in n‐ and p‐type (100) silicon

Shyam P. Murarka, S. Murarka, G. Quintana, 1977 .