Amiad Conley

EUV defect characterization study on post litho and etch for 1x and 2x node processes

Chris Ngai, Ofir Montal, Ido Dolev, 2011, Advanced Lithography.

From simulation to characterization - integrated approach for Self Aligned Double Patterning defectivity

Chris Ngai, Doron Meshulach, Amiad Conley, 2008, 2008 International Symposium on Semiconductor Manufacturing (ISSM).

Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning

Chris Ngai, Benjamin Szu-Min Lin, Amiad Conley, 2008, Lithography Asia.

Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping LER and defect density on production wafers

Doron Meshulach, Shimon Levi, Kobi Kan, 2009, Advanced Lithography.

Design based binning for litho qualification and process window qualification

Andreas Fischer, Uwe Seifert, Laurent Karsenti, 2008, SPIE Advanced Lithography.