Takashi Miyamatsu

Material design for immersion lithography with high refractive index fluid (HIF)

Yong Wang, Shiro Kusumoto, Takashi Chiba, 2005, SPIE Advanced Lithography.

High-refractive-index fluids for the next-generation ArF immersion lithography

Yong Wang, Shiro Kusumoto, Motoyuki Shima, 2006, SPIE Advanced Lithography.

Application of high-refractive index fluid to KrF-immersion lithography

Yong Wang, Koji Ito, Yoshikazu Yamaguchi, 2006, SPIE Advanced Lithography.

High-refractive index material design for ArF immersion lithography

Mark Slezak, Takashi Miyamatsu, Katsuhiko Hieda, 2007, SPIE Advanced Lithography.

High Refractive Index Fluid for Next Generation ArF Immersion Lithography

Yong Wang, Katsuhiko Hieda, Motoyuki Shima, 2006 .