Kevin K. Chan

Simulation-based defect printability analysis on attenuated phase-shifting masks

Qi-De Qian, Naoya Hayashi, Nobuhito Toyama, 2002, Photomask Japan.

Defect printability analysis on alternating phase-shifting masks

Qi-De Qian, Yasutaka Morikawa, Naoya Hayashi, 2002, Photomask Japan.