Raluca Tiron

发表

Surface affinity role in graphoepitaxy of lamellar block copolymers

Christophe Navarro, Maxime Argoud, Guillaume Claveau, 2016 .

Resist and BARC outgassing measured by TD-GCMS: investigation during the exposure or the bake steps of the lithographic process

B. Mortini, Raluca Tiron, Claire Sourd, 2007, European Mask and Lithography Conference.

Continuous evolution of lithographic films through process steps: an example with 193 chemically amplified resists

James W. Thackeray, Patrick Paniez, Raluca Tiron, 2010, Advanced Lithography.

Guided self-assembly of block-copolymer for CMOS technology: a comparative study between grapho-epitaxy and surface chemical modification

Raluca Tiron, Xavier Chevalier, Francesc Perez-Murano, 2011, Advanced Lithography.

DSA process characterization using BSE metrology (Conference Presentation)

Maxime Argoud, Shimon Levi, Raluca Tiron, 2018 .

DSA process window expansion with novel DSA track hardware

Yuji Tanaka, Masahiko Harumoto, Harold Stokes, 2017, Advanced Lithography.

Free surface BCP self-assembly process characterization with CDSEM

Maxime Argoud, Shimon Levi, Ofer Adan, 2016, SPIE Advanced Lithography.

Mechanical dynamical analysis of ultra thin resist films for microlithography applications

Raluca Tiron, Claire Sourd, Bénédicte Mortini, 2007, SPIE Microtechnologies.

Study of dynamical formation and shape of microlenses formed by the reflow method

C. Fellous, Raluca Tiron, Bénédicte Mortini, 2006, SPIE Advanced Lithography.

Process highlights to enhance directed self-assembly contact patterning performances

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2016 .

A track process for solvent annealing of high-χ BCPs

Masahiko Harumoto, Isabelle Servin, Laurent Pain, 2017, Advanced Lithography.

Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)

Christophe Navarro, Maxime Argoud, Gilles Cunge, 2013 .

Placement error in directed self-assembly of block copolymers for contact hole application

J. Hazart, Alain Ostrovsky, Patricia Pimenta Barros, 2016 .

Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements

Christophe Navarro, L. Pain, Christophe Couderc, 2012, Advanced Lithography.

193nm resist chemical modification induced by HBr cure plasma treatment: a TD-GC/MS outgassing study

Erwine Pargon, Raluca Tiron, Claire Sourd, 2011, Advanced Lithography.

Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

J. Andres Torres, Yuri Granik, Germain Fenger, 2014, European Mask and Lithography Conference.

193nm resist deprotection study from outgassing measurements by TD-GCMS/FID

James W. Thackeray, Patrick Paniez, Raluca Tiron, 2010, European Mask and Lithography Conference.

Advanced surface affinity control for DSA contact hole shrink applications

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2017, Advanced Lithography.

Investigation of coat-develop track system for placement error of contact hole shrink process

Yuji Tanaka, Masahiko Harumoto, Harold Stokes, 2016, SPIE Advanced Lithography.

Contact holes patterning by directed self-assembly of block copolymers: process window study

Christophe Navarro, Maxime Argoud, Patricia Pimenta Barros, 2015 .

Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small-angle X-ray scattering

Guillaume Freychet, Raluca Tiron, Xavier Chevalier, 2016 .

HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness

Olivier Joubert, Marc Fouchier, Erwine Pargon, 2011 .

PMMA removal selectivity to polystyrene using dry etch approach

Maxime Argoud, Nicolas Posseme, Raluca Tiron, 2016 .

Development of a statistical approach for DNA-based nanowires electrical study

Raluca Tiron, Xavier Baillin, Severine Cheramy, 2015, 2015 European Microelectronics Packaging Conference (EMPC).

DNA Origami Mask for Sub-Ten-Nanometer Lithography.

Raluca Tiron, Xavier Baillin, Christophe Brun, 2016, ACS nano.

Resist outgassing assessment for multi electron beams lithography

L. Pain, B. Icard, Raluca Tiron, 2014 .

Study on C60 Doped PMMA for Organic Memory Devices

Gerard Ghibaudo, C. Licitra, Raluca Tiron, 2010 .

Development of organic resistive memory for flexible electronics

Romain Coppard, Raluca Tiron, M. Charbonneau, 2012 .

Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study

Christophe Navarro, Laurent Pain, Raluca Tiron, 2011 .

PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication

Christophe Navarro, Maxime Argoud, Isabelle Servin, 2015 .

Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy

Christophe Navarro, Raluca Tiron, Xavier Chevalier, 2014 .

Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line

Charles Pieczulewski, Masaya Asai, Christophe Navarro, 2014 .