Takeo Sato

ArF quarter-micron projection lithography with an aspherical lens system

Yoshiyuki Tani, M. Sasago, K. Koga, 1990 .

Performance of 0.2 μm optical lithography using KrF and ArF excimer laser sources

Masaru Sasago, Noboru Nomura, Masayuki Endo, 1993 .