Hiroshi Minakata

Continuous growth of heavily doped p+-n+ Si epitaxial layer using low-temperature photoepitaxy

Tatsuya Yamazaki, Takashi Ito, Hiroshi Minakata, 1989 .

45-nm node CMOS integration with a novel STI structure and full-NCS/Cu interlayers for low-operation-power (lop) applications

T. Miyashita, Masaki Yamabe, Tetsu Tanaka, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..