W. Luo

Reliability characterization and prediction of high k dielectric thin film

Wen Luo, W. Luo, 2006 .

Preparation of Y‐Ba‐Cu‐O high Tc superconducting thin films by plasma‐assisted organometallic chemical vapor deposition

Xiaodong Zhang, W. Tao, G. Bai, 1989 .

A relation model of gate oxide yield and reliability

Kyungmee O. Kim, Way Kuo, Wen Luo, 2004, Microelectron. Reliab..

Strain and electric field dependent spin polarization in two-dimensional arsenene/CrI3 heterostructure

W. Luo, X. Jia, Wei-Bing Zhang, 2022, Journal of Alloys and Compounds.

Dielectric relaxation and breakdown detection of doped tantalum oxide high-k thin films

Yue Kuo, W. Kuo, Y. Kuo, 2004 .

Sub 2 nm Thick Zirconium Doped Hafnium Oxide High-K Gate Dielectrics

J. Peterson, M. Gardner, Tao Yuan, 2006 .

Stress testing and characterization of high-k dielectric thin films

Y. Kuo, W. Kuo, Y. Kuo, 2003, IEEE International Integrated Reliability Workshop Final Report, 2003.

Breakdown phenomena of zirconium-doped hafnium oxide high-k stack with an inserted interface layer

Tao Yuan, Yue Kuo, Jiang Lu, 2006 .