J. Shon

发表

A numerical study of the effect of gas injection position in an inductively coupled plasma discharge

J. Han, N. Yoon, D. Kwon, 2009 .

Temperature dependent gain of the atomic xenon laser

M. Kushner, G. Hebner, J. Shon, 1993 .

Predictions for gain in the fission‐fragment‐excited atomic xenon laser

M. Kushner, G. Hebner, J. Shon, 1993 .

Inductively Coupled Plasma Etching of Chemical-Vapor-Deposited Amorphous Carbon in N2/O2/Ar Chemistries

N. Lee, B. S. Kwon, Jin Sung Kim, 2009 .

Excitation mechanisms and gain modeling of the high‐pressure atomic Ar laser in He/Ar mixtures

M. Kushner, J. Shon, 1994 .

Oxygen ion energy distribution: Role of ionization, resonant, and nonresonant charge-exchange collisions

N. Babaeva, J. Shon, E. Hudson, 2005 .

Ion energy distribution control in single and dual frequency capacitive plasma sources

N. Babaeva, H. Kim, J. Shon, 2005 .

Modeling of plasma-etch processes using well stirred reactor approximations and including complex gas-phase and surface reactions

E. Meeks, E. Meeks, Jong Won Shon, 1995 .

Analytic model for a dual frequency capacitive discharge

Jae Koo Lee, Hyun-Chul Kim, J. Shon, 2003 .

Infinitely high etch selectivity during CH2F2/H2 dual-frequency capacitively coupled plasma etching of silicon nitride to chemical vapor-deposited a-C

N. Lee, B. S. Kwon, C. Jung, 2010 .

Sub-0.1 μm nitride hard mask open process without precuring the ArF photoresist

J. Moon, W. S. Lee, J. Kim, 2003 .

The structures of low dielectric constant SiOC thin films prepared by direct and remote plasma enhanced chemical vapor deposition

J. Han, Jaeyeong Heo, H. Kim, 2007 .

Modeling chemical downstream etch systems for NF{sub 3}/O{sub 2} mixtures

E. Meeks, R. Larson, S. Vosen, 1997 .

Ultrahigh Selective Etching of SiO2 Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C4F8 / CH2F2 / O2/Ar Plasmas

N. Lee, B. S. Kwon, J. Shon, 2010 .

Effects of atomic chlorine wall recombination: Comparison of a plasma chemistry model with experiment

P. Jones, E. Meeks, J. Shon, 1995 .

Discharge asymmetry induced by the pulsed radio-frequency current

Jae Koo Lee, J. Shon, Hyeong-Do Kim, 2004 .

Capacitively coupled plasma source operating in Xe/Ar mixtures

J. Shon, J. K. Lee, N. Yu Babaeva, 2005 .

Short pulse electron beam excitation of the high‐pressure atomic Ne laser

M. Kushner, J. Verdeyen, R. Rhoades, 1993 .

Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH2F2∕H2 plasmas

N. Lee, B. S. Kwon, C. Jung, 2010 .