B. Kim

Challenges in controlling plasma processes using artificial neural network

B. Kim, 2006 .

Monitoring of plasma processing chamber using ion energy analyser and time series neural network

B. Kim, S. Kim, 2010 .

A comparison of statistically-based and neural network models of plasma etch behavior

Gary S. May, C. D. Himmel, G. May, 1992, [1992 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium.

Pressure Controlled Surface Roughness of SiC Plasma Etching

B. Kim, B.‐T. Lee, 2004 .

Modelling of spatial plasma by using neural network

B. Kim, S. Y. Kim, 2009 .

Reactive ion etch modeling using neural networks and simulated annealing

Gary S. May, G. May, B. Kim, 1996 .

Modeling reactive ion etching of silicon dioxide films using neural networks

Gary S. May, B. Kim, B. Kim, 1994, 1994 Proceedings. 44th Electronic Components and Technology Conference.

On the use of a neural network to characterize the plasma etching of SiON thin films

K. K. Lee, B. Kim, B. T. Lee, 2005 .

Real-time diagnosis of semiconductor manufacturing equipment using a hybrid neural network expert system

Gary S. May, B. Kim, G. May, 1997 .