Rebecca D. Mih

Polymer-bound sensitizer in i-line resist formulations

Andrew R. Eckert, Wayne M. Moreau, Premlatha Jagannathan, 1998, Advanced Lithography.

Phase-shift focus monitor applications to lithography tool control

Eric P. Solecky, Donald C. Wheeler, Rebecca D. Mih, 1997, Advanced Lithography.

Ultralow-power technology

Terence B. Hook, Matthew J. Breitwisch, Orest Bula, 2003 .

Simulations and experiments with the phase-shift focus monitor

Timothy A. Brunner, Rebecca D. Mih, 1996, Advanced Lithography.

Using the focus monitor test mask to characterize lithographic performance

Timothy A. Brunner, David T. Long, Rebecca D. Mih, 1995, Advanced Lithography.

Lithographic implications for Cu/low-k integration

Steven Schneider, James T. Marsh, Rebecca D. Mih, 1999, Advanced Lithography.

Ultralow-power SRAM technology

Terence B. Hook, Atsushi Moriwaki, Matthew J. Breitwisch, 2003, IBM J. Res. Dev..

A high performance 0.13 /spl mu/m copper BEOL technology with low-k dielectric

Daniel C. Edelstein, Sampath Purushothaman, Alina Deutsch, 2000, Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407).

0.18 um modular triple self-aligned embedded split-gate flash memory

Rebecca D. Mih, Bomy A. Chen, Chung H. Lam, 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).