J. Kourtev

发表

Comparison of some basic plasma parameters and discharge characteristics of planar magnetron sputtering discharges in argon and neon

I. Ivanov, I. Petrov, V. Orlinov, 1990 .

Controllable low energy ion assistance as a tool for tailoring properties of gold oxide and gold–silver oxide thin films

J. Kourtev, R. Pascova, 2011 .

Effect of ion bombardment during growth on the electrical resistivity of magnetron-sputtered carbon films

I. Ivanov, I. Petrov, V. Orlinov, 1989 .

Influence of the Basic Process Parameters on the Ion/Atom Arrival Rate Ratio during Magnetron Sputter Deposition of Thin Carbon Films

I. Ivanov, I. Petrov, V. Orlinov, 1988 .

Influence of the abnormal ratio of the dependence of cathode sputtering rate on the current in a glow discharge

V. Orlinov, B. Goranchev, J. Kourtev, 1974 .

Deposition of carbon films by bias magnetron sputtering in neon and argon

I. Ivanov, I. Petrov, V. Orlinov, 1990 .

Spectroscopic investigation of tantalum nitride thin film deposition by reactive sputtering in a triode system

P. Georgiev, J. Kourtev, S. Dontchev, 1985 .

Electrostatic Probe Measurements in the Glow Discharge Plasma of a D. C. Magnetron Sputtering System

I. Ivanov, I. Petrov, V. Orlinov, 1988 .

A modified method for arc deposition of Ti-N thin films

J. Kourtev, R. Pascova, E. Weiβmantel, 1997 .

Arc evaporated TiN films with reduced macroparticle contamination

J. Kourtev, R. Pascova, E. Weißmantel, 1996 .

Plasma diagnostic of an RF magnetron Ar/N2 discharge

T. Chevolleau, W. Möller, A. Kolitsch, 2002 .