H. Shin

发表

Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges

V. M. Donnelly, D. J. Economou, H. Shin, 2012 .

Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

V. M. Donnelly, D. J. Economou, M. Kushner, 2012 .

Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode

V. M. Donnelly, D. J. Economou, H. Shin, 2011 .

Selective etching of TiN over TaN and vice versa in chlorine-containing plasmas

V. M. Donnelly, D. J. Economou, T. Lii, 2013 .

In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool

D. Ruzic, L. Meng, H. Shin, 2010 .

Work function engineering of graphene oxide via covalent functionalization for organic field-effect transistors

S. Lee, S. Kim, Jongsun Lim, 2017 .

Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas

V. M. Donnelly, D. J. Economou, H. Shin, 2012 .

Reflectivity degradation of grazing-incident EUV mirrors by EUV exposure and carbon contamination

R. Raju, David N. Ruzic, D. Ruzic, 2009 .

Development and characterization of a secondary RF plasma-assisted closed-field dual magnetron sputtering system for optical coatings on large-area substrates

D. Ruzic, L. Meng, M. Neumann, 2010 .