I. C. Abraham

发表

Ion energy distributions at rf-biased wafer surfaces

T. W. Hamilton, C. G. Willison, R. Shul, 2002 .

Ions in holes: An experimental study of ion distributions inside surface features on radio-frequency-biased wafers in plasma etching discharges

T. W. Hamilton, C. G. Willison, R. Shul, 2002 .

Surface dependent electron and negative ion density in SF6/argon gas mixtures

G. Hebner, I. C. Abraham, 2002 .

SiO2 to Si selectivity mechanisms in high density fluorocarbon plasma etching

Ion Cristian Abraham, R. Claude Woods, Amy E. Wendt, 1996 .

Charged Species Dynamics in an Inductively Coupled Ar/SF6 Plasma

S. Rauf, P. Ventzek, J. Woodworth, 2001 .

Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge

T. W. Hamilton, J. Woodworth, M. Riley, 2002 .

Absolute densities of long lived species in an ionized physical vapor deposition copper–argon plasma

A. Wendt, J. Booske, I. C. Abraham, 2000 .

Platinum Cluster Size Optimization via Chemical Synthesis and Laser Ablation Mass Spectrometry: Development of Enhanced Fuel Cell Catalysts

Deborah L. Mowery-Evans, E. Coker, S. Thornberg, 2003 .

Characterization of electron and negative ion densities in fluorocarbon containing inductively driven plasmas

G. Hebner, I. C. Abraham, 2001 .

Electrical and plasma property measurements of a deep reactive ion etching Bosch process

C. G. Willison, R. Shul, J. Woodworth, 2003 .

Experimental and theoretical study of ion distributions near 300 μm tall steps on rf-biased wafers in high density plasmas

T. W. Hamilton, D. J. Economou, C. G. Willison, 2003 .