W. Olbrich

发表

Improved control of TiN coating properties using cathodic arc evaporation with a pulsed bias

W. Olbrich, G. Kampschulte, J. Ebberink, 1991 .

Additional ion bombardment in PVD processes generated by a superimposed pulse bias voltage

W. Olbrich, G. Kampschulte, 1993 .

Superimposed pulse bias voltage used in arc and sputter technology

W. Olbrich, G. Kampschulte, 1993 .

Influence of variations of the steel substrate-Cr3Si(Cr)/MoS2−x film system on wear properties

G. Weise, W. Olbrich, G. Kampschulte, 1994 .

Possibility of studying concentration profiles of reactive species during PACVD (hard coating) in an industrial set-up

W. Olbrich, G. Kampschulte, O. Morlok, 1993 .

Cathodic arc deposition of TiN and Zr(C, N) at low substrate temperature using a pulsed bias voltage

J. Ebberink, W. Olbrich, J. Fessmann, 1991 .

Diffusion from the free surface into a liquid film in laminar flow over defined shapes

W. Olbrich, J. D. Wild, 1969 .

Low friction composite coating of CrxSiy/MoS2 on steel

G. Weise, W. Olbrich, G. Kampschulte, 1993 .