Chishio Koshimizu

Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

Chishio Koshimizu, Masaru Hori, Makoto Sekine, 2012 .

Simultaneous In situ Measurement of Silicon Substrate Temperature and Silicon Dioxide Film Thickness during Plasma Etching of Silicon Dioxide Using Low-Coherence Interferometry

S. Tsuchitani, Masafumi Ito, Chishio Koshimizu, 2012 .

Simultaneous measurement of substrate temperature and thin-film thickness on SiO2/Si wafer using optical-fiber-type low-coherence interferometry

K. Takeda, Masafumi Ito, Chishio Koshimizu, 2009 .

Low-Coherence Interferometry-Based Non-Contact Temperature Monitoring of a Silicon Wafer and Chamber Parts during Plasma Etching

Masafumi Ito, Chishio Koshimizu, T. Ohta, 2010 .

Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N2/Ar Gas

M. Hori, M. Sekine, K. Takeda, 2011 .