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P. M. Vallinga
发表
Sheath properties of RF plasmas in a parallel-plate etch reactor; the low-frequency regime (ω
P. M. Vallinga, F. D. Hoog, 1989 .
Plasma Parameters and Weakly Non-Ideal Behaviour of a High Density, Super-Atmospheric 2kA Cascade Arc in Argon
D. Schram, G. Kroesen, P. M. Vallinga, 1988 .