Y. Uhara

发表

Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

M. Itoh, T. Ohno, D. Yagyu, 2015 .

Temperature dependence of the work function of Bi2Sr2CaCu2O8 single crystal cleaved at low temperature

T. Tani, Y. Uhara, N. Yajima, 2005 .

Copper filling of deep sub-μm through-holes by high-vacuum planar magnetron sputtering using argon gas with added oxygen

H. Hayashi, E. Nishikawa, Y. Uhara, 2009 .

Cu filling of 10 nm trenches by high-magnetic-field magnetron sputtering

S. Saito, Y. Uhara, M. Itoh, 2014 .

Copper Filling of Deep Sub-µm Through-Holes by High-Vacuum Planar Magnetron Sputtering Using Argon Gas with Added Nitrogen: Optimum Quantity of Nitrogen in Argon Gas

S. Saito, Y. Uhara, Tsutomu Miura, 2006 .

Fabrication of carbon nanomaterials using supercritical states of ethanol and binary system of ethanol and carbon dioxide for LSI interconnects

K. Nishikawa, S. Saito, Y. Uhara, 2018, Japanese Journal of Applied Physics.

Comparison of Bi2Sr2CaCu2O8 surfaces cleaved at low temperature and at room temperature from secondary ion mass spectrometry and work function measurements

H. Yamasaki, Y. Uhara, T. Soumura, 2005 .

Cu filling into trenches with Co (00.2) layer by using high-vacuum magnetron sputtering in N2-addded Ar gas

S. Saito, Y. Uhara, M. Itoh, 2015 .