K. Hasnat

Manufacturing sensitivity analysis of a 0.18-micron NMOSFET

Al F. Tasch, Darryl Angelo, S. A. Hareland, 1996, Advanced Lithography.

Analysis and design considerations for manufacturable and reliable 0.18-micron N-MOSFETs

K. Hasnat, Christine M. Maziar, S. Jallepalli, 1994, Advanced Lithography.

A Computationally Efficient Model for version Layer Quantization Effects in Submicron N-Channel MOSFET' s

S. A. Hareland, K. Hasnat, Christine M. Maziar, 1996 .

Detailed evaluation of different inversion layer electron and hole mobility models

K. Hasnat, Christine M. Maziar, Al F. Tasch, 1995, Proceedings of the Eleventh Biennial University/Government/ Industry Microelectronics Symposium.

A manufacturing sensitivity analysis of 0.35 /spl mu/m LDD MOSFET's

K. Hasnat, Al F. Tasch, S. Murtaza, 1994 .

A computationally efficient model for inversion layer quantization effects in deep submicron N-channel MOSFETs

K. Hasnat, S. Jallepalli, C.-F. Yeap, 1995, Proceedings of International Electron Devices Meeting.