Heang-Seuk Lee

发表

Interband tansition and electronic structures in strained InxGa1−xN/GaN multiple quantum well

Saeyoung Ahn, Jung Hwa Lee, Tak-Hyun Kim, 2013 .

Morphology and structural properties of nanocrystalline and nanocolumnar aluminum thin films grown on glass and Ti/glass substrates

S. Sharma, A. I. Inamdar, H. Im, 2012 .

Study of Cu diffusion behavior in low dielectric constant SiOC(-H) films deposited by plasma-enhanced chemical vapor deposition

Chang Young Kim, R. Navamathavan, J. Woo, 2010 .

UV irradiation effects on the bonding structure and electrical properties of ultra low-k SiOC(–H) thin films for 45 nm technology node

Chang Young Kim, R. Navamathavan, M. Hyun, 2011 .

Ultraviolet irradiation effect on the properties of leakage current and dielectric breakdown of low-dielectric-constant SiOC(H) films using comb capacitor structure

Chang Young Kim, R. Navamathavan, M. Hyun, 2011 .

Effect of evaporated copper and aluminum on post-annealed SiOC(-H) films deposited using plasma-enhanced chemical vapor deposition

Chang Young Kim, R. Navamathavan, J. Woo, 2010 .

Investigation of Electrical Conduction in Low-dielectric-constantSiOC(-H) Thin Films Deposited by Using PECVD

R. Navamathavan, Changyoung Kim, Heon-Ju Lee, 2009 .

Frequency-dependent Capacitance-Voltage and Conductance-Voltage Characteristics of Low-dielectric-constant SiOC(-H) Thin Films Deposited by Using Plasma-enhanced Chemical Vapor Deposition

R. Navamathavan, M. Hyun, J. Woo, 2010 .