Chang-Nam Ahn

发表

EUV stochastic noise analysis and LCDU mitigation by etching on dense contact-hole array patterns

Seo Min Kim, Sunyoung Koo, Jun-Taek Park, 2014, Advanced Lithography.

Optical lithography simulation considering impact of mask errors

Chang-Nam Ahn, Hee-Bom Kim, Won-Kwang Ma, 2002, SPIE Advanced Lithography.

Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography

Chang-Nam Ahn, Hee-Bom Kim, Ki-Soo Shin, 2002, SPIE Advanced Lithography.

Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2001, SPIE Photomask Technology.

Effect of pattern density for contact windows in an attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Il-Ho Lee, 1995, Advanced Lithography.

Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Chang-Nam Ahn, Seung-Weon Paek, Ki-Soo Shin, 2001, SPIE Advanced Lithography.

Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications

Gijsbert Rispens, Chang-Moon Lim, Chang-Nam Ahn, 2018, Advanced Lithography.

Mask critical dimension error on optical lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2000, Photomask Japan.

0.33-k1 ArF lithography for 100-nm DRAM

Chang-Nam Ahn, Cheol-Kyu Bok, Hee-Bom Kim, 2002, SPIE Advanced Lithography.

Understanding of stochastic noise

Chang-Moon Lim, Chang-Nam Ahn, Anita Fumar-Pici, 2015, Advanced Lithography.

Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Yong-Suk Lee, 1995, Advanced Lithography.

Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Chang-Nam Ahn, Hee-Bom Kim, Ki-Soo Shin, 2001, SPIE Advanced Lithography.

Negative chemically amplified resist in making mask for a logic device with high pattern density

Chang-Nam Ahn, Seong-Ho Jeong, Hyun-Joon Cho, 2003, Photomask Japan.

Application of deep-UV attenuated PSM to 0.2-um contact hole patterning technology

Ki-Ho Baik, Chang-Nam Ahn, Il-Ho Lee, 1996, Photomask Technology.

Exposure latitude analysis for dense line and space patterns by using diffused aerial image model

Chang-Nam Ahn, Hee-Bom Kim, Ki Ho Baik, 2000, Advanced Lithography.

Validation of repair process for DUV attenuated phase-shift mask

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2000, Advanced Lithography.

Intrafield CD variation by stray light from neighboring field

Chang-Moon Lim, Chang-Nam Ahn, Ki-Soo Shin, 2002, SPIE Advanced Lithography.

Accuracy of diffused aerial image model for full-chip-level optical proximity correction

Chang-Nam Ahn, Hee-Bom Kim, Ki Ho Baik, 2000, Advanced Lithography.

Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF

Ki-Ho Baik, Chang-Nam Ahn, Young-Mog Ham, 1999, Advanced Lithography.

Limitation of optical lithography for various resolution enhancement technologies

Chang-Nam Ahn, Cheol-Kyu Bok, Tae-Seung Eom, 2002, SPIE Advanced Lithography.

Quantitative analysis of mask error effect on wafer CD variation in ArF lithography

Chang-Nam Ahn, Ki-Soo Shin, Sang-Sool Koo, 2001, Photomask Japan.

Practical implementation of alternating PSM to memory device of sub-0.25-um technology

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1996, Advanced Lithography.

Investigation on micro-trench formation of alternating aperture phase shift masks

Chang-Nam Ahn, Lee-Ju Kim, Hong-Seok Kim, 2003, Photomask Japan.

Novel approximate model for resist process

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1998, Advanced Lithography.

Characteristics of RIE lag and pattern density effect in alternating aperture phase shift masks

Chang-Nam Ahn, Byung-Soo Chang, Lee-Ju Kim, 2005, SPIE Photomask Technology.

EUV contact-hole local CD uniformity optimization for DRAM storage node application

Chang-Moon Lim, Chang-Nam Ahn, Mijung Lim, 2018, Advanced Lithography.

Optical Proximity Correction Using Diffused Aerial Image Model

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1999 .

Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography

Chang-Nam Ahn, Hung-Eil Kim, KeunYoung Kim, 1995, Photomask Technology.

Optical design of EUV attenuated PSM for contact-hole applications

Chang-Nam Ahn, Nakgeuon Seong, Anthony Yen, 2021, Advanced Lithography.

Study on the potentialities of sub-100nm optical lithography of alternating and phase-edge phase shift mask for ArF lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2001 .

The Implementation Of Sub-150nm Contact Hole Pattern By Resist Flow Process

Ki-Ho Baik, Chang-Nam Ahn, Cheol-Kyu Bok, 1998, Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).

Study on elliptical polarization illumination effects for microlithography

Ki-Ho Baik, Chang-Nam Ahn, Donggyu Yim, 1996 .