Ko Akiteru

Track based techniques to improve high-resolution EUV patterning defectivity

Nelson Felix, Cody Murray, Eric Liu, 2018, Photomask Technology.

Defect detection strategies and process partitioning for single-expose EUV patterning

Nelson Felix, Koichiro Tanaka, Eric Liu, 2018 .

Defect detection strategies and process partitioning for SE EUV patterning

Jeffrey Shearer, John Arnold, Nelson Felix, 2018, Advanced Lithography.